Anodization process of aluminum microelectrode for a single-electron transistor operating at room temperature

Takami Muto, Yasuo Kimura, Michio Niwano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publication66th DRC Device Research Conference Digest, DRC 2008
Pages103-104
Number of pages2
DOIs
Publication statusPublished - 2008 Dec 1
Event66th DRC Device Research Conference Digest, DRC 2008 - Santa Barbara, CA, United States
Duration: 2008 Jun 232008 Jun 25

Publication series

NameDevice Research Conference - Conference Digest, DRC
ISSN (Print)1548-3770

Other

Other66th DRC Device Research Conference Digest, DRC 2008
CountryUnited States
CitySanta Barbara, CA
Period08/6/2308/6/25

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Muto, T., Kimura, Y., & Niwano, M. (2008). Anodization process of aluminum microelectrode for a single-electron transistor operating at room temperature. In 66th DRC Device Research Conference Digest, DRC 2008 (pp. 103-104). [4800755] (Device Research Conference - Conference Digest, DRC). https://doi.org/10.1109/DRC.2008.4800755