Annealing properties of open volumes in HfSiO x and HfAlO x gate dielectrics studied using monoenergetic positron beams

A. Uedono, K. Ikeuchi, K. Yamabe, T. Ohdaira, M. Muramatsu, R. Suzuki, A. S. Hamid, T. Chikyow, K. Torii, K. Yamada

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20 Citations (Scopus)


Thin Hf0.6Si0.4Ox and Hf0.3Al0.7Ox films fabricated by metal-organic chemical-vapor deposition and atomic-layer-deposition techniques were characterized using monoenergetic positron beams. Measurements of the Doppler broadening spectra of annihilation radiation and the lifetime spectra of positions indicated that positrons annihilated from the trapped state by open volumes that exist intrinsically in amorphous structures of the films. For HfSiOx, the mean size of the open volumes and their size distribution decreased with increasing postdeposition annealing (PDA) temperature. For HfAlOx, although the overall behavior of the open volumes in response to annealing was similar to that for HfSiOx, PDA caused a separation of the mean size of the open volumes. When this separation occurred, the value of the line-shape parameter S increased, suggesting an oxygen deficiency in the amorphous matrix. This fragmentation of the amorphous matrix can be suppressed by decreasing the annealing time.

Original languageEnglish
Article number023506
JournalJournal of Applied Physics
Issue number2
Publication statusPublished - 2005 Jul 15
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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