Annealing effect in structural and electrical properties of sputtered Mo thin film

P. Chelvanathan, Z. Zakaria, Y. Yusoff, M. Akhtaruzzaman, M. M. Alam, M. A. Alghoul, K. Sopian, N. Amin

Research output: Contribution to journalArticlepeer-review

37 Citations (Scopus)


In this study, the effects of vacuum annealing on the structural and electrical properties of DC-sputtered molybdenum (Mo) thin films have been investigated. Mo thin films were deposited by DC sputtering and subsequently subjected to vacuum annealing in a tube furnace from 350 to 500 °C. Films that were deposited with different temperatures showed good adhesion with soda lime glass substrate after "tape testing". X-ray diffraction (XRD) spectra have indicated existence of (1 1 0) and (2 1 1) orientations. However, I(1 1 0)/I(2 1 1) peak intensity ratio decreased for all vacuum annealed Mo films compared to as-sputtered films indicating change of preferential orientation. This suggests vacuum annealing can be employed to tailor the Mo thin film atomic packing density of the plane parallel to the substrate. SEM images of surface morphology clearly show compact and dense triangular like grains for as-sputtered film, while annealed films at 350 °C, 400 °C and 450 °C indicate rice-like grains. Stony grains with less uniformity were detected for films annealed for 500 °C. Meanwhile, electrical resistivity is insensitive to the vacuum annealing condition as all films showed more or less same resistivity in the range of 3 × 10 -5 -6 × 10 -5 Ω cm.

Original languageEnglish
Pages (from-to)129-137
Number of pages9
JournalApplied Surface Science
Publication statusPublished - 2015 Apr 15
Externally publishedYes


  • Annealing
  • Mo
  • Sputtering growth
  • Structural properties
  • Thin films

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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