TY - JOUR
T1 - Annealing effect and floating zone refining of copper under hydrogen atmosphere
AU - Ishikawa, Yukio
AU - Mimura, Kouji
AU - Isshiki, Minoru
PY - 1999
Y1 - 1999
N2 - High purity Cu is prepared by a floating zone refining method. The effect of the annealing atmosphere on the residual resistivity ratio of Cu is examined for purity evaluation of floating zone refined Cu. An advantage of hydrogen annealing as a heat treatment for residual resistivity measurement of Cu compared to ultra high vacuum annealing has been revealed. The residual resistivity ratio of the starting material, 99.9999% Cu, was 3200, and that of purified Cu was 36000. This RRR is the highest value reported on annealed samples under a strong reducting atmosphere. Floating zone refining under reduced hydrogen atmosphere is effective for the preparation of ultra high purity Cu.
AB - High purity Cu is prepared by a floating zone refining method. The effect of the annealing atmosphere on the residual resistivity ratio of Cu is examined for purity evaluation of floating zone refined Cu. An advantage of hydrogen annealing as a heat treatment for residual resistivity measurement of Cu compared to ultra high vacuum annealing has been revealed. The residual resistivity ratio of the starting material, 99.9999% Cu, was 3200, and that of purified Cu was 36000. This RRR is the highest value reported on annealed samples under a strong reducting atmosphere. Floating zone refining under reduced hydrogen atmosphere is effective for the preparation of ultra high purity Cu.
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U2 - 10.2320/matertrans1989.40.87
DO - 10.2320/matertrans1989.40.87
M3 - Article
AN - SCOPUS:0033075088
VL - 40
SP - 87
EP - 91
JO - Materials Transactions
JF - Materials Transactions
SN - 1345-9678
IS - 2
ER -