Annealing behavior of a-IGZO film deposited by rotation magnet sputtering

Akihiko Hiroe, Tetsuya Goto, Tadahiro Ohmi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

We have developed Rotation Magnet Sputtering where small erosion loops move thereby creating uniform erosion over the target. Target utilization rate can be more than 60%. Investigation on the annealing behavior deposited by Rotation Magnet Sputtering revealed that oxygen out diffusion during the post annealing depends on deposition chemistry.

Original languageEnglish
Title of host publicationSociety for Information Display - 18th International Display Workshops 2011, IDW'11
Pages665-668
Number of pages4
Publication statusPublished - 2011 Dec 1
Event18th International Display Workshops 2011, IDW 2011 - Nagoya, Japan
Duration: 2011 Dec 72011 Dec 9

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Other

Other18th International Display Workshops 2011, IDW 2011
CountryJapan
CityNagoya
Period11/12/711/12/9

ASJC Scopus subject areas

  • Computer Vision and Pattern Recognition
  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging

Fingerprint Dive into the research topics of 'Annealing behavior of a-IGZO film deposited by rotation magnet sputtering'. Together they form a unique fingerprint.

Cite this