Anisotropic Si etching condition for preparing optically smooth surfaces

Engineering & Materials Science

• Etching 100%
• Microcavities 99%
• Surface roughness 51%
• Dry etching 45%
• Wet etching 43%
• Dyes 35%
• Lasers 23%
• Polymers 22%
• Water 16%

Physics & Astronomy

• etching 70%
• surface roughness 31%
• ethylenediamine 27%
• dummies 25%
• etchants 23%
• replicas 19%
• lasing 16%
• Q factors 16%
• alignment 14%
• polymers 10%
• water 10%

Chemical Compounds

• Surface Roughness 37%
• Surface 29%
• Ethylenediamine 17%
• Hexagonal Space Group 14%
• Shape 12%
• Dye 11%