Angled exposure method for pattering on three-dimensional structures

Vijay Kumar Singh, Minoru Sasaki, Kazuhiro Hane

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

Photolithography on three-dimensional structures is becoming a key process for realizing new micromechanical devices. Patterning on three-dimensional structures using the conventional mask aligner is a difficult task. In this paper, we present an approach for transferring patterns on cavities prepared by anisotropic etching. A new method of angled exposing is introduced for improving the uniformity of the incident-light-power density transmitted into the resist film deposited on the cavities. This method also reduces the number of reflections coming from the sidewalls of the cavities. Polarized light is used for realizing a pattern on the narrow cavities with a high aspect ratio.

Original languageEnglish
Pages (from-to)6449-6453
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number9 B
DOIs
Publication statusPublished - 2007 Sep 20

Keywords

  • Angled exposure
  • Polarized light
  • Reflection
  • Spray coating
  • Three-dimensional photolithography

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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