Analysis of the relaxation process of electron–hole pairs in α-Al2O3 using transient absorption spectroscopy

Masanori Koshimizu, Yusa Muroya, Shinichi Yamashita, Hiroki Yamamoto, Yutaka Fujimoto, Keisuke Asai

Research output: Contribution to journalArticlepeer-review


We measured transient absorption in α-Al2O3 after pulsed electron beam irradiation to analyze the relaxation process of excited states. We used two measurement systems to obtain transient absorption in nanosecond and picosecond time scales. In the nanosecond time scale, we observed a band at 610 nm in addition to a shoulder at 420 nm. This observation is consistent with that in a previous paper, and these bands are attributed to Al interstitials according to the paper. The decay behavior of these bands was significantly different in the picosecond time scale. The difference in the decay kinetics strongly suggests that the band at 610 nm and the shoulder at 420 nm are attributed to two kinds of Al interstitials.

Original languageEnglish
Pages (from-to)7091-7094
Number of pages4
JournalJournal of Materials Science: Materials in Electronics
Issue number10
Publication statusPublished - 2017 May 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Analysis of the relaxation process of electron–hole pairs in α-Al<sub>2</sub>O<sub>3</sub> using transient absorption spectroscopy'. Together they form a unique fingerprint.

Cite this