Analysis of the effect of gas convection on temperature distribution in a wafer during rapid thermal processing with lamp heaters

Shigeci Hirasawa, Tadasi Suzuki, Shigenao Maruyama, Yuhei Takeuchi

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

A three-dimensional radiation heat transfer analysis and a convection heat transfer are combined to obtain temperature distribution in a wafer during rapid thermal processing with lamp heaters. Calculated data of the temperature distribution from the radiation analysis are transferred to the convection analysis through data files, and calculated data of the convection heat flux on the wafer from the convection analysis are transferred to the radiation analysis. The obtained temperature'distributions show that the average temperature of a wafer decreases about 10°C by the effect of natural convection and that the temperature distribution in the wafer increased about 3°C when inlet gas velocity is 0.1 m/s during 1000°C steady-state heating of the wafer. It was found that the calculation mesh size for each analysis of the combined analysis can be changed.

Original languageEnglish
Pages (from-to)1035
Number of pages1
JournalNihon Kikai Gakkai Ronbunshu, B Hen/Transactions of the Japan Society of Mechanical Engineers, Part B
Volume67
Issue number656
DOIs
Publication statusPublished - 2001 Apr

Keywords

  • Furnace
  • Heat treatment
  • Natural convection
  • Numerical analysis
  • Thermal radiation
  • Wafer

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanical Engineering

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