Analysis of the atomic structure of the Si(111)√3×√3-Bi surface by x-ray photoelectron diffraction

Chong Yun Park, Tadashi Abukawa, Kazuyuki Higashiyama, Shozo Kono

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

It is found by X-ray photoelectron spectroscopy and LEED that the saturation coverage of Bi is one monolayer for the Si(111)√3×√3-Bi surface. Azimuthal dependence of Bi 4d photoelectron diffraction has been measured for the Si(111)√3×√3-Bi surface and analyzed kinematically. The results of the analysis have confirmed the presence of Bi-triplets with sides of 3.1 Å as proposed by X-ray diffraction. It is further found that the Bi-triplets form an overlayer on the substrate.

Original languageEnglish
Pages (from-to)L1335-L1337
JournalJapanese journal of applied physics
Volume26
Issue number8A
DOIs
Publication statusPublished - 1987 Aug
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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