Analysis of silicon surface in connection with its unique electrochemical and etching behavior

Hirokazu Fukidome, Teruhisa Ohno, Michio Matsumura

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

We have found that silicon shows a large anodic current and a high etching rate in ammonium fluoride solutions at a pH of approximately 6.4. The reason for the unique pH dependencies was investigated by analyzing silicon surfaces after treatments with ammonium fluoride solutions at various pHs. Zeta potentials of the surfaces treated with a solution at a pH of approximately 6.4 were different from those treated at other pHs, suggesting a high reactivity in solutions in this pH region with silicon surfaces. X-ray photoelectron spectra of silicon showed that the amount of fluorine atoms bound to the surface was largest after treatment with a solution at a pH 6.4. These results are discussed in connection with the unique electrochemical and etching behavior of silicon in aqueous solutions of ammonium fluoride.

Original languageEnglish
Pages (from-to)679-682
Number of pages4
JournalJournal of the Electrochemical Society
Volume144
Issue number2
DOIs
Publication statusPublished - 1997 Feb
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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