TY - GEN
T1 - Analysis of RF plasma using electrical equivalent circuit
AU - Hirayama, Masaki
AU - Ino, Kazuhide
AU - Ohmi, Tadahiro
N1 - Copyright:
Copyright 2019 Elsevier B.V., All rights reserved.
PY - 1995
Y1 - 1995
UR - http://www.scopus.com/inward/record.url?scp=85063389604&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85063389604&partnerID=8YFLogxK
U2 - 10.1109/ISSM.1995.524408
DO - 10.1109/ISSM.1995.524408
M3 - Conference contribution
AN - SCOPUS:85063389604
T3 - IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
SP - 283
EP - 286
BT - 1995 IEEE/UCS/SEMI International Symposium on Semiconductor Manufacturing, ISSM 1995
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 1995 IEEE/UCS/SEMI International Symposium on Semiconductor Manufacturing, ISSM 1995
Y2 - 17 September 1995 through 19 September 1995
ER -