Analysis of RF plasma using electrical equivalent circuit

Masaki Hirayama, Kazuhide Ino, Tadahiro Ohmi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publication1995 IEEE/UCS/SEMI International Symposium on Semiconductor Manufacturing, ISSM 1995
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages283-286
Number of pages4
ISBN (Electronic)0780329287, 9780780329287
DOIs
Publication statusPublished - 1995
Event1995 IEEE/UCS/SEMI International Symposium on Semiconductor Manufacturing, ISSM 1995 - Austin, United States
Duration: 1995 Sep 171995 Sep 19

Publication series

NameIEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
ISSN (Print)1523-553X

Conference

Conference1995 IEEE/UCS/SEMI International Symposium on Semiconductor Manufacturing, ISSM 1995
CountryUnited States
CityAustin
Period95/9/1795/9/19

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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