TY - JOUR
T1 - Analysis of Metallic Glass Sample Including Niobium, Boron and Silicon by Microwave-Assisted Dissolution/Inductively Coupled Plasma-Optical Emission Spectrometry Using Hydrofluoric and Nitric Acids Mixture
AU - Ishikuro, Mikio
AU - Wagatsuma, Kazuaki
N1 - Copyright:
Copyright 2011 Elsevier B.V., All rights reserved.
PY - 2008/12
Y1 - 2008/12
N2 - Metallic glasses containing iron, cobalt, niobium, boron and silicon were analyzed. The samples could be dissolved only with a mixture of hydrofluoric acid and nitric acid. After a sample dissolved, metallic elements were determined by inductively coupled plasma-optical emission spectrometry (ICP-OES). Conventional ICP-OES instruments were not employed because hydrofluoric acid attacked the plasma torch, chamber and nebulizer, which were made of quartz or glass. When a sample solution contained hydrofluoric acid, hydrofluoric acid was removed by heating with sulfuric acid. However, this removal technique led to a loss of boron and silicon. By a microwave-assisted dissolution procedure with a mixture of hydrofluoric acid and nitric acid, boron and silicon were not vaporized. A hydrofluoric acid resisting ICP-OES instrument was employed for elemental determination. The total values of all the elements determined were almost 100%.
AB - Metallic glasses containing iron, cobalt, niobium, boron and silicon were analyzed. The samples could be dissolved only with a mixture of hydrofluoric acid and nitric acid. After a sample dissolved, metallic elements were determined by inductively coupled plasma-optical emission spectrometry (ICP-OES). Conventional ICP-OES instruments were not employed because hydrofluoric acid attacked the plasma torch, chamber and nebulizer, which were made of quartz or glass. When a sample solution contained hydrofluoric acid, hydrofluoric acid was removed by heating with sulfuric acid. However, this removal technique led to a loss of boron and silicon. By a microwave-assisted dissolution procedure with a mixture of hydrofluoric acid and nitric acid, boron and silicon were not vaporized. A hydrofluoric acid resisting ICP-OES instrument was employed for elemental determination. The total values of all the elements determined were almost 100%.
KW - Fe-Co-Nb-B-Si metallic glass
KW - ICP-OES
KW - Microwave-assisted dissolution method
KW - Mixture of hydrofluoric acid and nitric acid
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U2 - 10.2116/bunsekikagaku.57.897
DO - 10.2116/bunsekikagaku.57.897
M3 - Comment/debate
AN - SCOPUS:58149517913
VL - 57
SP - 897
EP - 900
JO - Bunseki Kagaku
JF - Bunseki Kagaku
SN - 0525-1931
IS - 11
ER -