Analysis of gas convection and temperature distribution in a rotating wafer in a cylindrical lamp heating apparatus

Shigeki Hirasawa, Shigenao Maruyama

Research output: Contribution to journalConference articlepeer-review

3 Citations (Scopus)

Abstract

A three-dimensional radiation-heat-transfer analysis and a convection-heat-transfer analysis are combined in order to determine the temperature distribution in a rotating wafer in a cylindrical lamp heating apparatus for rapid thermal processing. The calculated results show that the temperature variation in the wafer increases 1.4 K by the effect of natural convection, when inlet gas velocity is 0.1 m/s during 1273 K steady-state heating of the non-rotating wafer. The effect of gas convection on the temperature variations in the wafer can be minimized when the wafer is rotating in an axisymmetric apparatus and the heating rates of the lamps are optimally controlled.

Original languageEnglish
Pages (from-to)45-51
Number of pages7
JournalAmerican Society of Mechanical Engineers, Heat Transfer Division, (Publication) HTD
Volume372
Issue number5
DOIs
Publication statusPublished - 2002 Dec 1
Event2002 ASME International Mechanical Engineering Congress and Exposition - New Orleans, LA, United States
Duration: 2002 Nov 172002 Nov 22

ASJC Scopus subject areas

  • Mechanical Engineering
  • Fluid Flow and Transfer Processes

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