Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group

K. Kato, Takeo Miyake, Y. Beppu, T. Tanii, I. Ohdomari

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Original languageEnglish
    Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
    Pages60-61
    Number of pages2
    DOIs
    Publication statusPublished - 2007 Dec 1
    Events20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
    Duration: 2007 Nov 52007 Nov 8

    Publication series

    NameDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

    Other

    Others20th International Microprocesses and Nanotechnology Conference, MNC 2007
    CountryJapan
    CityKyoto
    Period07/11/507/11/8

    ASJC Scopus subject areas

    • Hardware and Architecture
    • Electrical and Electronic Engineering

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