@inproceedings{2043a2b55694418fb01da90ccc2ea97c,
title = "Analysis of dopant diffusion and defect evolution during sub-millisecond non-melt laser annealing based on an atomistic kinetic Monte Carlo approach",
abstract = "Sub-millisecond (ms) non-melt laser annealing (NLA) is investigated through experiments and atomistic KMC modeling. NLA can improve the dopant activation dramatically and achieve shallow junctions. B diffusivity during sub-ms annealing is discussed for the first time. Our KMC model with F nVm, complexes indicates that the thermal budget of sub-ms annealing is too small for full defect evolution and one possible solution for defect stabilization is F co-implant.",
author = "T. Noda and W. Vandervorst and S. Felch and V. Parihar and C. Vrancken and S. Severi and A. Falepin and T. Janssens and H. Bender and {Van Daele}, B. and P. Eyben and M. Niwa and R. Schreutelkamp and F. Nouri and Absil, {P. P.} and M. Jurczak and {De Meyer}, K. and S. Biesemans",
year = "2006",
month = jan,
day = "1",
doi = "10.1109/IEDM.2006.346789",
language = "English",
isbn = "1424404398",
series = "Technical Digest - International Electron Devices Meeting, IEDM",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2006 International Electron Devices Meeting Technical Digest, IEDM",
note = "2006 International Electron Devices Meeting, IEDM ; Conference date: 10-12-2006 Through 13-12-2006",
}