An LSI for massive parallel electron beam lithography: Its design and evaluation

Hiroshi Miyaguchi, Masanori Muroyama, Shinya Yoshida, Naokatsu Ikegami, Akira Kojima, Ryosuke Kaneko, Kentaro Totsu, Shuji Tanaka, Nobuyoshi Koshida, Masayoshi Esashi

Research output: Contribution to journalArticlepeer-review

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Engineering & Materials Science