Amorphous silicon structure of heat-treated poly(n-propylsilyne) studied by far-infrared spectroscopy

A. Watanabe, Y. Nagai, M. Matsuda, M. Suezawa, K. Sumino

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

The formation of amorphous silicon using a silicon network polymer as a precursor was investigated. Poly(n-propylsilyne), which has a silicon network structure, was heat-treated in vacuo. The organic side group of poly(n-propylsilyne) disappeared completely and the optical band gap Eg,opt decreased from 2.91 to 1.29 eV by heat-treatment at 400°C. The heat-treated poly(n-propylsilyne) showed a far-infared absorption spectrum similar to amorphous silicon.

Original languageEnglish
Pages (from-to)132-136
Number of pages5
JournalChemical Physics Letters
Volume207
Issue number2-3
DOIs
Publication statusPublished - 1993 May 21

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

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