Amorphous carbon thin films containing benzene rings for use as low-dielectric-constant interlayer dielectrics

Kazuhiko Endo, Toru Tatsumi

Research output: Contribution to journalArticlepeer-review

37 Citations (Scopus)

Abstract

The effect on the thermal and dielectric properties of incorporating benzene rings in hydrogenated amorphous carbon (a-C:H) films was investigated. The benzene rings were introduced into a-C:H films by using plasma-enhanced chemical vapor deposition and aromatic source compounds. The a-C:H film that contained benzene rings had thermal stability up to 400°C and a low-dielectric constant of 3.0. The difference in the dielectric constant and thermal stability of a-C:H films appeared to be due to the hydrogen concentration of the films.

Original languageEnglish
Pages (from-to)2616-2618
Number of pages3
JournalApplied Physics Letters
Volume70
Issue number19
DOIs
Publication statusPublished - 1997 May 12
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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