Ammonothermal epitaxy of wurtzite GaN using an NH4I mineralizer

Y. Kagamitani, T. Kuribayashi, K. Hazu, T. Onuma, D. Tomida, R. Simura, S. F. Chichibu, K. Sugiyama, C. Yokoyama, T. Ishiguro, T. Fukuda

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17 Citations (Scopus)

Abstract

Purely wurtzite phase needle crystals and epitaxial layers of GaN were grown by the ammonothermal method using an NH4I mineralizer. The inclusion of zincblende phase GaN was effectively eliminated by increasing the growth temperature higher than 500 °C. Accordingly, an approximately 20-μm-thick GaN epitaxial layer was achieved on the Ga-polar face of a c-plane GaN seed wafer at 520 °C. Although the characteristic deep state emission band dominated the room temperature photoluminescence spectrum, the near-band-edge emission of GaN was observed for both the needle crystals and the epitaxial layers. These results encourage one to grow better quality GaN crystals at a high growth rate under high-temperature growth conditions.

Original languageEnglish
Pages (from-to)3384-3387
Number of pages4
JournalJournal of Crystal Growth
Volume312
Issue number22
DOIs
Publication statusPublished - 2010 Nov 1

Keywords

  • A.1. Crystal structure
  • A.2. Growth from high temperature solutions
  • A.2. Single crystal growth
  • A.3. Liquid phase epitaxy
  • B.2. Semiconducting gallium compounds

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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    Kagamitani, Y., Kuribayashi, T., Hazu, K., Onuma, T., Tomida, D., Simura, R., Chichibu, S. F., Sugiyama, K., Yokoyama, C., Ishiguro, T., & Fukuda, T. (2010). Ammonothermal epitaxy of wurtzite GaN using an NH4I mineralizer. Journal of Crystal Growth, 312(22), 3384-3387. https://doi.org/10.1016/j.jcrysgro.2010.07.065