Al2O3-Ta2O5-ZrO2 thin films having high corrosion resistance to strong acid and alkali solutions

Shinji Katayama, Noboru Akao, Nobuyoshi Hara, Katsuhisa Sugimoto

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

In order to develop an insulator film for an electrolyte-insulator- semiconductor capacitor pH sensor which can be used in a wide pH range, the corrosion resistance of Al2O3-Ta2O 5-ZrO2 films formed by metallorganic chemical vapor deposition has been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HCl and 1 M NaOH solutions. The films with the cationic mole fraction of Al, XAl, smaller than 0.4, the cationic mole fraction of Ta, XTa, larger than 0.3, and the cationic mole fraction of Zr, XZr, larger than 0.3 showed high corrosion resistance against both solutions.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume152
Issue number8
DOIs
Publication statusPublished - 2005 Oct 7

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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