Al2O3-Ta2O5-ZrO2 thin films having high corrosion resistance to strong acid and alkali solutions

K. Sugimoto; S. Katayama; N. Akao; Nobuyoshi Hara

Al2O3-Ta2O5-ZrO2 thin films having high corrosion resistance to strong acid and alkali solutions

K. Sugimoto, S. Katayama, N. Akao, Nobuyoshi Hara

Research output: Contribution to conference › Paper › peer-review

Abstract

In order to obtain thin films with corrosion resistance against acid and alkali solutions, the corrosion characteristics of Al₂O ₃-Ta₂O₅-ZrO₂ firms formed by metalorganic chemical vapor deposition (MOCVD) have been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HC1 and l M NaOH. The films with the cationic mole fraction of Al, X_Al smaller than 0.4, the cationic mole fraction of Ta, X _Ta, larger than 0.3 and the cationic mole fraction of Zr, X _Zr, larger than 0.3 showed high corrosion resistance against both the solutions.

Original language	English
Pages	192-201
Number of pages	10
Publication status	Published - 2003 Dec 1
Event	Surface Oxide Films - Proceedings of the International Symposium - Orlando, FL., United States Duration: 2003 Oct 12 → 2003 Oct 17

Other

Other	Surface Oxide Films - Proceedings of the International Symposium
Country/Territory	United States
City	Orlando, FL.
Period	03/10/12 → 03/10/17

ASJC Scopus subject areas

Engineering(all)

Cite this

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title = "Al2O3-Ta2O5-ZrO2 thin films having high corrosion resistance to strong acid and alkali solutions",

abstract = "In order to obtain thin films with corrosion resistance against acid and alkali solutions, the corrosion characteristics of Al2O 3-Ta2O5-ZrO2 firms formed by metalorganic chemical vapor deposition (MOCVD) have been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HC1 and l M NaOH. The films with the cationic mole fraction of Al, XAl smaller than 0.4, the cationic mole fraction of Ta, X Ta, larger than 0.3 and the cationic mole fraction of Zr, X Zr, larger than 0.3 showed high corrosion resistance against both the solutions.",

author = "K. Sugimoto and S. Katayama and N. Akao and Nobuyoshi Hara",

year = "2003",

month = dec,

day = "1",

language = "English",

pages = "192--201",

note = "Surface Oxide Films - Proceedings of the International Symposium ; Conference date: 12-10-2003 Through 17-10-2003",

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TY - CONF

T1 - Al2O3-Ta2O5-ZrO2 thin films having high corrosion resistance to strong acid and alkali solutions

AU - Sugimoto, K.

AU - Katayama, S.

AU - Akao, N.

AU - Hara, Nobuyoshi

PY - 2003/12/1

Y1 - 2003/12/1

N2 - In order to obtain thin films with corrosion resistance against acid and alkali solutions, the corrosion characteristics of Al2O 3-Ta2O5-ZrO2 firms formed by metalorganic chemical vapor deposition (MOCVD) have been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HC1 and l M NaOH. The films with the cationic mole fraction of Al, XAl smaller than 0.4, the cationic mole fraction of Ta, X Ta, larger than 0.3 and the cationic mole fraction of Zr, X Zr, larger than 0.3 showed high corrosion resistance against both the solutions.

AB - In order to obtain thin films with corrosion resistance against acid and alkali solutions, the corrosion characteristics of Al2O 3-Ta2O5-ZrO2 firms formed by metalorganic chemical vapor deposition (MOCVD) have been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HC1 and l M NaOH. The films with the cationic mole fraction of Al, XAl smaller than 0.4, the cationic mole fraction of Ta, X Ta, larger than 0.3 and the cationic mole fraction of Zr, X Zr, larger than 0.3 showed high corrosion resistance against both the solutions.

UR - http://www.scopus.com/inward/record.url?scp=3042846770&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=3042846770&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:3042846770

SP - 192

EP - 201

T2 - Surface Oxide Films - Proceedings of the International Symposium

Y2 - 12 October 2003 through 17 October 2003

ER -

Al2O3-Ta2O5-ZrO2 thin films having high corrosion resistance to strong acid and alkali solutions

Abstract

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