Abstract
In order to obtain thin films with corrosion resistance against acid and alkali solutions, the corrosion characteristics of Al2O 3-Ta2O5-ZrO2 firms formed by metalorganic chemical vapor deposition (MOCVD) have been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HC1 and l M NaOH. The films with the cationic mole fraction of Al, XAl smaller than 0.4, the cationic mole fraction of Ta, X Ta, larger than 0.3 and the cationic mole fraction of Zr, X Zr, larger than 0.3 showed high corrosion resistance against both the solutions.
Original language | English |
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Pages | 192-201 |
Number of pages | 10 |
Publication status | Published - 2003 Dec 1 |
Event | Surface Oxide Films - Proceedings of the International Symposium - Orlando, FL., United States Duration: 2003 Oct 12 → 2003 Oct 17 |
Other
Other | Surface Oxide Films - Proceedings of the International Symposium |
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Country/Territory | United States |
City | Orlando, FL. |
Period | 03/10/12 → 03/10/17 |
ASJC Scopus subject areas
- Engineering(all)