Al2O3-Ta2O5-ZrO2 thin films having high corrosion resistance to strong acid and alkali solutions

K. Sugimoto, S. Katayama, N. Akao, Nobuyoshi Hara

Research output: Contribution to conferencePaperpeer-review

Abstract

In order to obtain thin films with corrosion resistance against acid and alkali solutions, the corrosion characteristics of Al2O 3-Ta2O5-ZrO2 firms formed by metalorganic chemical vapor deposition (MOCVD) have been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HC1 and l M NaOH. The films with the cationic mole fraction of Al, XAl smaller than 0.4, the cationic mole fraction of Ta, X Ta, larger than 0.3 and the cationic mole fraction of Zr, X Zr, larger than 0.3 showed high corrosion resistance against both the solutions.

Original languageEnglish
Pages192-201
Number of pages10
Publication statusPublished - 2003 Dec 1
EventSurface Oxide Films - Proceedings of the International Symposium - Orlando, FL., United States
Duration: 2003 Oct 122003 Oct 17

Other

OtherSurface Oxide Films - Proceedings of the International Symposium
Country/TerritoryUnited States
CityOrlando, FL.
Period03/10/1203/10/17

ASJC Scopus subject areas

  • Engineering(all)

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