In order to obtain thin films with corrosion resistance against acid and alkali solutions, the corrosion characteristics of Al2O 3-Ta2O5-ZrO2 firms formed by metalorganic chemical vapor deposition (MOCVD) have been investigated. Dissolution rates of the films deposited on a Pt substrate were measured by ellipsometry in 6 M HC1 and l M NaOH. The films with the cationic mole fraction of Al, XAl smaller than 0.4, the cationic mole fraction of Ta, X Ta, larger than 0.3 and the cationic mole fraction of Zr, X Zr, larger than 0.3 showed high corrosion resistance against both the solutions.
|Number of pages||10|
|Publication status||Published - 2003 Dec 1|
|Event||Surface Oxide Films - Proceedings of the International Symposium - Orlando, FL., United States|
Duration: 2003 Oct 12 → 2003 Oct 17
|Other||Surface Oxide Films - Proceedings of the International Symposium|
|Period||03/10/12 → 03/10/17|
ASJC Scopus subject areas