Alkali-metal adsorption on silicon surfaces studied by field ion-scanning tunneling microscopy (FISTM)

Tomihiro Hashizume, Y. Hasegawa, Toshio Sakurai

    Research output: Contribution to journalArticlepeer-review

    14 Citations (Scopus)

    Abstract

    Adsorption of alkali metals (Li, K, Cs) on the Si(111) and Si(100) surfaces has been investigated by field ion-scanning tunneling microscopy (FISTM). The FISTM data suggest that alkali-metal atoms absorb quite differently between the (111) and (100) surface: almost completely ionized on the (111)7 × 7 surface, while there is small charge transfer on the (100)2 × 1 surface.

    Original languageEnglish
    Pages (from-to)119-124
    Number of pages6
    JournalApplied Surface Science
    Volume48-49
    Issue numberC
    DOIs
    Publication statusPublished - 1991 Jan 1

    ASJC Scopus subject areas

    • Chemistry(all)
    • Condensed Matter Physics
    • Physics and Astronomy(all)
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films

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