Advanced TiN metal-gate FinFET technology

Y. X. Liu, E. Sugimata, T. Matsukawa, M. Masahara, K. Endo, K. Ishii, T. Shimizu, H. Yamauchi, S. O'uchi, Eiichi Suzuki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

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Engineering & Materials Science