Advanced plasma science and its applications for nitride and nanomaterials

Satoshi Kamiyama; Yasufumi Fujiwara; Mineo Hiramatsu; Masafumi Ito; Toshiro Kaneko; Makoto Kasu; Hideto Miyake; Keiji Nakamura; Kazuaki Sawada; Makoto Sekine; Yuichi Setsuhara; Tatsuru Shirafuji; Hirofumi Takikawa; Kazuo Terashima; Akihiro Wakahara; Yoshimi Watanabe

doi:10.7567/JJAP.53.11R001

Advanced plasma science and its applications for nitride and nanomaterials

Satoshi Kamiyama, Yasufumi Fujiwara, Mineo Hiramatsu, Masafumi Ito, Toshiro Kaneko, Makoto Kasu, Hideto Miyake, Keiji Nakamura, Kazuaki Sawada, Makoto Sekine, Yuichi Setsuhara, Tatsuru Shirafuji, Hirofumi Takikawa, Kazuo Terashima, Akihiro Wakahara, Yoshimi Watanabe

ENG - Electronic Engineering

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

The special issue of Japanese Journal of Applied Physics consists of peer-reviewed papers based on presentations at the 6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2014) held at Meijo University, Nagoya, Japan during March 3-6, 2014. The scope of the symposium is advanced plasma science and technology and its application in nitride and related materials research and in nanomaterial research. A total of 362 papers including 46 invited talks and 50 contributed talks were presented at the symposium, attended by 529 participants including 133 from overseas.

Original language	English
Article number	11R001
Journal	Japanese journal of applied physics
Volume	53
Issue number	11
DOIs	https://doi.org/10.7567/JJAP.53.11R001
Publication status	Published - 2014 Nov 1

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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Kamiyama, S., Fujiwara, Y., Hiramatsu, M., Ito, M., Kaneko, T., Kasu, M., Miyake, H., Nakamura, K., Sawada, K., Sekine, M., Setsuhara, Y., Shirafuji, T., Takikawa, H., Terashima, K., Wakahara, A., & Watanabe, Y. (2014). Advanced plasma science and its applications for nitride and nanomaterials. Japanese journal of applied physics, 53(11), [11R001]. https://doi.org/10.7567/JJAP.53.11R001

Advanced plasma science and its applications for nitride and nanomaterials. / Kamiyama, Satoshi; Fujiwara, Yasufumi; Hiramatsu, Mineo; Ito, Masafumi; Kaneko, Toshiro; Kasu, Makoto; Miyake, Hideto; Nakamura, Keiji; Sawada, Kazuaki; Sekine, Makoto; Setsuhara, Yuichi; Shirafuji, Tatsuru; Takikawa, Hirofumi; Terashima, Kazuo; Wakahara, Akihiro; Watanabe, Yoshimi.

In: Japanese journal of applied physics, Vol. 53, No. 11, 11R001, 01.11.2014.

Research output: Contribution to journal › Article › peer-review

Kamiyama, S, Fujiwara, Y, Hiramatsu, M, Ito, M, Kaneko, T, Kasu, M, Miyake, H, Nakamura, K, Sawada, K, Sekine, M, Setsuhara, Y, Shirafuji, T, Takikawa, H, Terashima, K, Wakahara, A & Watanabe, Y 2014, 'Advanced plasma science and its applications for nitride and nanomaterials', Japanese journal of applied physics, vol. 53, no. 11, 11R001. https://doi.org/10.7567/JJAP.53.11R001

Kamiyama, Satoshi ; Fujiwara, Yasufumi ; Hiramatsu, Mineo ; Ito, Masafumi ; Kaneko, Toshiro ; Kasu, Makoto ; Miyake, Hideto ; Nakamura, Keiji ; Sawada, Kazuaki ; Sekine, Makoto ; Setsuhara, Yuichi ; Shirafuji, Tatsuru ; Takikawa, Hirofumi ; Terashima, Kazuo ; Wakahara, Akihiro ; Watanabe, Yoshimi. / Advanced plasma science and its applications for nitride and nanomaterials. In: Japanese journal of applied physics. 2014 ; Vol. 53, No. 11.

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abstract = "The special issue of Japanese Journal of Applied Physics consists of peer-reviewed papers based on presentations at the 6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2014) held at Meijo University, Nagoya, Japan during March 3-6, 2014. The scope of the symposium is advanced plasma science and technology and its application in nitride and related materials research and in nanomaterial research. A total of 362 papers including 46 invited talks and 50 contributed talks were presented at the symposium, attended by 529 participants including 133 from overseas.",

author = "Satoshi Kamiyama and Yasufumi Fujiwara and Mineo Hiramatsu and Masafumi Ito and Toshiro Kaneko and Makoto Kasu and Hideto Miyake and Keiji Nakamura and Kazuaki Sawada and Makoto Sekine and Yuichi Setsuhara and Tatsuru Shirafuji and Hirofumi Takikawa and Kazuo Terashima and Akihiro Wakahara and Yoshimi Watanabe",

note = "Funding Information: Acknowledgements: We thank Dr. T. ZABOTINA for help in F ACScan-analysis. This work was supported by grants 93-04-21355 from the Russian Foundation for Basic Research.",

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doi = "10.7567/JJAP.53.11R001",

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AU - Kasu, Makoto

AU - Miyake, Hideto

AU - Nakamura, Keiji

AU - Sawada, Kazuaki

AU - Sekine, Makoto

AU - Setsuhara, Yuichi

AU - Shirafuji, Tatsuru

AU - Takikawa, Hirofumi

AU - Terashima, Kazuo

AU - Wakahara, Akihiro

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Advanced plasma science and its applications for nitride and nanomaterials

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