Advanced plasma science and its applications for nitride and nanomaterials

Satoshi Kamiyama, Yasufumi Fujiwara, Mineo Hiramatsu, Masafumi Ito, Toshiro Kaneko, Makoto Kasu, Hideto Miyake, Keiji Nakamura, Kazuaki Sawada, Makoto Sekine, Yuichi Setsuhara, Tatsuru Shirafuji, Hirofumi Takikawa, Kazuo Terashima, Akihiro Wakahara, Yoshimi Watanabe

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The special issue of Japanese Journal of Applied Physics consists of peer-reviewed papers based on presentations at the 6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2014) held at Meijo University, Nagoya, Japan during March 3-6, 2014. The scope of the symposium is advanced plasma science and technology and its application in nitride and related materials research and in nanomaterial research. A total of 362 papers including 46 invited talks and 50 contributed talks were presented at the symposium, attended by 529 participants including 133 from overseas.

Original languageEnglish
Article number11R001
JournalJapanese journal of applied physics
Volume53
Issue number11
DOIs
Publication statusPublished - 2014 Nov 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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  • Cite this

    Kamiyama, S., Fujiwara, Y., Hiramatsu, M., Ito, M., Kaneko, T., Kasu, M., Miyake, H., Nakamura, K., Sawada, K., Sekine, M., Setsuhara, Y., Shirafuji, T., Takikawa, H., Terashima, K., Wakahara, A., & Watanabe, Y. (2014). Advanced plasma science and its applications for nitride and nanomaterials. Japanese journal of applied physics, 53(11), [11R001]. https://doi.org/10.7567/JJAP.53.11R001