@article{d9ac94da0eb24adbb829daaa24fc7daf,
title = "Advanced nano-devices produced by high-performance plasma etching processes",
keywords = "High density plasma, Nanodevices, Neutral beam, Radiation damage, Super-fine etching technology, ULSI",
author = "Seiji Samukawa",
note = "Copyright: Copyright 2010 Elsevier B.V., All rights reserved.",
year = "2007",
doi = "10.2493/jjspe.73.993",
language = "English",
volume = "73",
pages = "993--998",
journal = "Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering",
issn = "0912-0289",
publisher = "Japan Society for Precision Engineering",
number = "9",
}