Advanced nano-devices produced by high-performance plasma etching processes

Seiji Samukawa

doi:10.2493/jjspe.73.993

Advanced nano-devices produced by high-performance plasma etching processes

Innovative Energy Research Center

Research output: Contribution to journal › Review article › peer-review

Original language	English
Pages (from-to)	993-998
Number of pages	6
Journal	Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Volume	73
Issue number	9
DOIs	https://doi.org/10.2493/jjspe.73.993
Publication status	Published - 2007

Keywords

High density plasma
Nanodevices
Neutral beam
Radiation damage
Super-fine etching technology
ULSI

ASJC Scopus subject areas

Mechanical Engineering

Access to Document

10.2493/jjspe.73.993

Cite this

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title = "Advanced nano-devices produced by high-performance plasma etching processes",

keywords = "High density plasma, Nanodevices, Neutral beam, Radiation damage, Super-fine etching technology, ULSI",

author = "Seiji Samukawa",

year = "2007",

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language = "English",

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pages = "993--998",

journal = "Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering",

issn = "0912-0289",

publisher = "Japan Society for Precision Engineering",

number = "9",

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KW - Radiation damage

KW - Super-fine etching technology

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