Advanced nano-devices produced by high-performance plasma etching processes

Research output: Contribution to journalReview articlepeer-review

Original languageEnglish
Pages (from-to)993-998
Number of pages6
JournalSeimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Volume73
Issue number9
DOIs
Publication statusPublished - 2007

Keywords

  • High density plasma
  • Nanodevices
  • Neutral beam
  • Radiation damage
  • Super-fine etching technology
  • ULSI

ASJC Scopus subject areas

  • Mechanical Engineering

Cite this