Adsorption of fluorinated C60 on the Si(111)-(7 × 7) surface studied by scanning tunneling microscopy and high-resolution electron energy loss spectroscopy

Yasunori Fujikawa; Jerzy T. Sadowski; Kevin F. Kelly; Koji S. Nakayama; Edward T. Mickelson; Robert H. Hauge; John L. Margrave; Toshio Sakurai

doi:10.1143/JJAP.41.245

Adsorption of fluorinated C₆₀ on the Si(111)-(7 × 7) surface studied by scanning tunneling microscopy and high-resolution electron energy loss spectroscopy

Yasunori Fujikawa, Jerzy T. Sadowski, Kevin F. Kelly, Koji S. Nakayama, Edward T. Mickelson, Robert H. Hauge, John L. Margrave, Toshio Sakurai

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Article

9 Citations (Scopus)

Abstract

The adsorption structure of fluorinated C₆₀ molecules deposited on the Si(111)-(7 × 7) surface was studied using scanning tunneling microscopy (STM) and high-resolution electron energy loss spectroscopy (HREELS). The results of HREELS revealed the existence of the silicon-fluorine vibration modes with the energy of 103-107 meV. indicating that some of the fluorine atoms were detached from the molecules and chemisorbed to the surface. These fluorine adsorption sites were observed around the adsorbed molecules directly in the STM images. Many of the fluorine-adsorbed sites were found to form thread-like structures. Random formation of the F-Si bonds on the surface prohibits the fluorinated fullerene's freedom from forming an ordered monolayer on the Si(111)-(7 × 7) surface.

Original language	English
Pages (from-to)	245-249
Number of pages	5
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	41
Issue number	1
DOIs	https://doi.org/10.1143/JJAP.41.245
Publication status	Published - 2002 Jan 1

Keywords

C
Fluorine
HREELS
STM
Si(111)-(7 × 7)

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/JJAP.41.245

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Fujikawa, Y., Sadowski, J. T., Kelly, K. F., Nakayama, K. S., Mickelson, E. T., Hauge, R. H., Margrave, J. L., & Sakurai, T. (2002). Adsorption of fluorinated C₆₀ on the Si(111)-(7 × 7) surface studied by scanning tunneling microscopy and high-resolution electron energy loss spectroscopy. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 41(1), 245-249. https://doi.org/10.1143/JJAP.41.245

Adsorption of fluorinated C₆₀ on the Si(111)-(7 × 7) surface studied by scanning tunneling microscopy and high-resolution electron energy loss spectroscopy. / Fujikawa, Yasunori; Sadowski, Jerzy T.; Kelly, Kevin F.; Nakayama, Koji S.; Mickelson, Edward T.; Hauge, Robert H.; Margrave, John L.; Sakurai, Toshio.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 41, No. 1, 01.01.2002, p. 245-249.

Research output: Contribution to journal › Article

Fujikawa, Y, Sadowski, JT, Kelly, KF, Nakayama, KS, Mickelson, ET, Hauge, RH, Margrave, JL & Sakurai, T 2002, 'Adsorption of fluorinated C₆₀ on the Si(111)-(7 × 7) surface studied by scanning tunneling microscopy and high-resolution electron energy loss spectroscopy', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 41, no. 1, pp. 245-249. https://doi.org/10.1143/JJAP.41.245

Fujikawa Y, Sadowski JT, Kelly KF, Nakayama KS, Mickelson ET, Hauge RH et al. Adsorption of fluorinated C₆₀ on the Si(111)-(7 × 7) surface studied by scanning tunneling microscopy and high-resolution electron energy loss spectroscopy. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2002 Jan 1;41(1):245-249. https://doi.org/10.1143/JJAP.41.245

Fujikawa, Yasunori ; Sadowski, Jerzy T. ; Kelly, Kevin F. ; Nakayama, Koji S. ; Mickelson, Edward T. ; Hauge, Robert H. ; Margrave, John L. ; Sakurai, Toshio. / Adsorption of fluorinated C₆₀ on the Si(111)-(7 × 7) surface studied by scanning tunneling microscopy and high-resolution electron energy loss spectroscopy. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2002 ; Vol. 41, No. 1. pp. 245-249.

@article{36a3516cf61d444eb686aa1870f0f7a9,

title = "Adsorption of fluorinated C60 on the Si(111)-(7 × 7) surface studied by scanning tunneling microscopy and high-resolution electron energy loss spectroscopy",

abstract = "The adsorption structure of fluorinated C60 molecules deposited on the Si(111)-(7 × 7) surface was studied using scanning tunneling microscopy (STM) and high-resolution electron energy loss spectroscopy (HREELS). The results of HREELS revealed the existence of the silicon-fluorine vibration modes with the energy of 103-107 meV. indicating that some of the fluorine atoms were detached from the molecules and chemisorbed to the surface. These fluorine adsorption sites were observed around the adsorbed molecules directly in the STM images. Many of the fluorine-adsorbed sites were found to form thread-like structures. Random formation of the F-Si bonds on the surface prohibits the fluorinated fullerene's freedom from forming an ordered monolayer on the Si(111)-(7 × 7) surface.",

keywords = "C, Fluorine, HREELS, STM, Si(111)-(7 × 7)",

author = "Yasunori Fujikawa and Sadowski, {Jerzy T.} and Kelly, {Kevin F.} and Nakayama, {Koji S.} and Mickelson, {Edward T.} and Hauge, {Robert H.} and Margrave, {John L.} and Toshio Sakurai",

year = "2002",

month = jan,

day = "1",

doi = "10.1143/JJAP.41.245",

language = "English",

volume = "41",

pages = "245--249",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "1",

}

TY - JOUR

T1 - Adsorption of fluorinated C60 on the Si(111)-(7 × 7) surface studied by scanning tunneling microscopy and high-resolution electron energy loss spectroscopy

AU - Fujikawa, Yasunori

AU - Sadowski, Jerzy T.

AU - Kelly, Kevin F.

AU - Nakayama, Koji S.

AU - Mickelson, Edward T.

AU - Hauge, Robert H.

AU - Margrave, John L.

AU - Sakurai, Toshio

PY - 2002/1/1

Y1 - 2002/1/1

N2 - The adsorption structure of fluorinated C60 molecules deposited on the Si(111)-(7 × 7) surface was studied using scanning tunneling microscopy (STM) and high-resolution electron energy loss spectroscopy (HREELS). The results of HREELS revealed the existence of the silicon-fluorine vibration modes with the energy of 103-107 meV. indicating that some of the fluorine atoms were detached from the molecules and chemisorbed to the surface. These fluorine adsorption sites were observed around the adsorbed molecules directly in the STM images. Many of the fluorine-adsorbed sites were found to form thread-like structures. Random formation of the F-Si bonds on the surface prohibits the fluorinated fullerene's freedom from forming an ordered monolayer on the Si(111)-(7 × 7) surface.

AB - The adsorption structure of fluorinated C60 molecules deposited on the Si(111)-(7 × 7) surface was studied using scanning tunneling microscopy (STM) and high-resolution electron energy loss spectroscopy (HREELS). The results of HREELS revealed the existence of the silicon-fluorine vibration modes with the energy of 103-107 meV. indicating that some of the fluorine atoms were detached from the molecules and chemisorbed to the surface. These fluorine adsorption sites were observed around the adsorbed molecules directly in the STM images. Many of the fluorine-adsorbed sites were found to form thread-like structures. Random formation of the F-Si bonds on the surface prohibits the fluorinated fullerene's freedom from forming an ordered monolayer on the Si(111)-(7 × 7) surface.

KW - C

KW - Fluorine

KW - HREELS

KW - STM

KW - Si(111)-(7 × 7)

UR - http://www.scopus.com/inward/record.url?scp=0036313804&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036313804&partnerID=8YFLogxK

U2 - 10.1143/JJAP.41.245

DO - 10.1143/JJAP.41.245

M3 - Article

AN - SCOPUS:0036313804

VL - 41

SP - 245

EP - 249

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 1

ER -