Adsorption behavior of various fluorocarbon gases on silicon wafer surface

Atsushi Hidaka, Satoru Yamashita, Hidekazu Ishii, Takeyoshi Kato, Naoki Tanahashi, Masafumi Kitano, Tetsuya Goto, Akinobu Teramoto, Yasuyuki Shirai, Tadahiro Ohmi

Research output: Contribution to journalArticlepeer-review

Abstract

An analytical technique to clarifying the adsorption behavior of a fluorocarbon gas, which is one of the key steps in reactive ion etching, has been established. In this paper, we focus on the adsorption behavior of fluorocarbon gases to the silicon wafer surface to clarify the etching mechanism in order to realize etching to a high aspect ratio. Each fluorocarbon gas had surface selectivity for SiO2, Si and the photoresist. Each fluorocarbon gas reacted differently at the silicon wafer surface. As a result, the etching mechanism could be clarified using this newly established analytical technique. Therefore, an etching mechanism will be able to be clarified by applying the newly established analytical technique to the fluorocarbon gases expected to be useful for etching of high aspect ratio and further high performance ultra large scale integrated circuit device must be realized.

Original languageEnglish
Pages (from-to)2245-2251
Number of pages7
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume44
Issue number4 B
DOIs
Publication statusPublished - 2005 Apr 1

Keywords

  • Adsorption behavior
  • Fluorocarbon gas
  • High aspect ratio
  • Reactive ion etching
  • Surface selectivity

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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