Adsorption and reactions of NO on clean and CO-precovered Ir(111)

Tadahiro Fujitani, Isao Nakamura, Yukihiro Kobayashi, Atsushi Takahashi, Masaaki Haneda, Hideaki Hamada

Research output: Contribution to journalArticlepeer-review

39 Citations (Scopus)

Abstract

Adsorption and reactions of NO on clean and CO-precovered Ir(111) were investigated by means of X-ray photoelectron spectroscopy (XPS), high-resolution electron energy loss spectroscopy (HR-EELS), infrared reflection absorption spectroscopy (IRAS), and temperature-programmed desorption (TPD). Two NO adsorption states, indicative of fcc-hollow sites and atop sites, were present on the Ir(111) surface at saturation coverage. NO adsorbed on hollow sites dissociated to Na and Oa at temperatures above 283 K. The dissociated Na desorbed to form N2 by recombination of Na at 574 K and by a disproportionation reaction between atop-NO and Na at 471 K. Preadsorbed CO inhibited the adsorption of NO on atop sites, whereas adsorption on hollow sites was not affected by the coexistence of CO. The adsorbed CO reacted with dissociated Oa and desorbed as CO2 at 574 K.

Original languageEnglish
Pages (from-to)17603-17607
Number of pages5
JournalJournal of Physical Chemistry B
Volume109
Issue number37
DOIs
Publication statusPublished - 2005 Sep 22
Externally publishedYes

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Adsorption and reactions of NO on clean and CO-precovered Ir(111)'. Together they form a unique fingerprint.

Cite this