Adsorption and Desorption Kinetics of Organosilanes at Si(001) Surfaces

Karuppanan Senthil, Hideki Nakazawa, Maki Suemitsu

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Adsorption and desorption kinetics of organosilanes [dimethylsilane (DMS) and monomethylsilane (MMS)] at Si(001) surfaces have been investigated by using temperature-programmed desorption (TPD), and compared with those of acetylene (C2H2)- and atomic hydrogen (H)-adsorbed Si surfaces. TPD spectra from DMS/Si(001) present β1 (∼510°C), β1 (∼550°C), γ (∼615°C) and δ (∼910°C) peaks while MMS/Si(001) shows only β1 (∼510°C) and δ (∼870°C) peaks. C2H 2/Si(001) presents β1 (∼510°C) and γ (∼615°C) peaks as well but showed no β1 and δ peaks. The β1 peak, observed for DMS, is currently understood to be due to hydrogen desorption from the Si-H at a Si-C hetero-dimer. Unlike MMS, the appearance of the bulk-carbon related γ peak from the initial DMS adsorption suggests enhanced C incorporation with the use of DMS. The analysis of the hydrogen uptake curve also implies that DMS and MMS have different adsorption kinetics.

Original languageEnglish
Pages (from-to)6804-6808
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number11
DOIs
Publication statusPublished - 2003 Nov

Keywords

  • Adsorption kinetics
  • Dimethylsilane
  • Hydrogen desorption
  • Monomethylsilane
  • Organosilanes
  • SIC
  • Si(001)

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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