Abstract
Adsorption and desorption kinetics of organosilanes [dimethylsilane (DMS) and monomethylsilane (MMS)] at Si(001) surfaces have been investigated by using temperature-programmed desorption (TPD), and compared with those of acetylene (C2H2)- and atomic hydrogen (H)-adsorbed Si surfaces. TPD spectra from DMS/Si(001) present β1 (∼510°C), β1 (∼550°C), γ (∼615°C) and δ (∼910°C) peaks while MMS/Si(001) shows only β1 (∼510°C) and δ (∼870°C) peaks. C2H 2/Si(001) presents β1 (∼510°C) and γ (∼615°C) peaks as well but showed no β1 and δ peaks. The β1 peak, observed for DMS, is currently understood to be due to hydrogen desorption from the Si-H at a Si-C hetero-dimer. Unlike MMS, the appearance of the bulk-carbon related γ peak from the initial DMS adsorption suggests enhanced C incorporation with the use of DMS. The analysis of the hydrogen uptake curve also implies that DMS and MMS have different adsorption kinetics.
| Original language | English |
|---|---|
| Pages (from-to) | 6804-6808 |
| Number of pages | 5 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 42 |
| Issue number | 11 |
| DOIs | |
| Publication status | Published - 2003 Nov |
| Externally published | Yes |
Keywords
- Adsorption kinetics
- Dimethylsilane
- Hydrogen desorption
- Monomethylsilane
- Organosilanes
- SIC
- Si(001)
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)