Active parts for CH4 decomposition and electrochemical oxidation at metal/oxide interfaces by isotope labeling-secondary ion mass spectrometry

Teruhisa Horita, Haruo Kishimoto, Katsuhiko Yamaji, Natsuko Sakai, Yueping Xiong, Manuel E. Brito, Harumi Yokokawa, Muneaki Rai, Koji Amezawa, Yoshiharu Uchimoto

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

Active parts for CH4 decomposition and electrochemical oxidation of reformed gases were investigated at the well defined Ni-mesh/oxide interfaces in μm level. The effective reaction areas were determined by isotope labeling technique under the mixture of CH4, D2O, and 18O2 at 1073 K. A deposition of carbon preferentially occurred on the Ni-mesh surface on Y2O3-stabilized ZrO2 (YSZ) and Sm2O3-doped CeO2 (SDC) electrolyte oxides. A slight reduction of carbon deposition was observed on SDC substrate under non-polarized condition. The electronic and structural properties changes of Ni were observed by XANES/EXAFS analysis. By anodic polarization, a significant reduction of deposited carbon was observed on Ni-mesh surface in Ni-mesh/YSZ and Ni-mesh/SDC samples. Oxygen spill over can be effective for eliminating the deposited carbon on the Ni-mesh. Hydrogen and isotope oxygen concentration (18O2) on the Ni-mesh was changed by the oxide substrates under anodic polarization.

Original languageEnglish
Pages (from-to)3179-3185
Number of pages7
JournalSolid State Ionics
Volume177
Issue number35-36
DOIs
Publication statusPublished - 2006 Nov 30
Externally publishedYes

Keywords

  • Anode/electrolyte interfaces
  • Isotope labeling
  • Secondary ion mass spectrometry (SIMS)
  • Solid oxide fuel cells (SOFCs)
  • XANES/EXAFS

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

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