Accurate thickness determination of ultrathin silicon oxide film by x-ray photoelectron spectroscopy

K. Takahashi, T. Nakamura, H. Nohira, K. Hirose, T. Hattori

    Research output: Contribution to journalArticlepeer-review

    Original languageEnglish
    Pages (from-to)715-719
    Number of pages5
    JournalShinku/Journal of the Vacuum Society of Japan
    Issue number8
    Publication statusPublished - 2001

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces, Coatings and Films
    • Electrical and Electronic Engineering

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