Accurate measurement of EUV multilayer period thicknesses by in situ automatic ellipsometry

T. Tsuru, T. Tsutou, T. Hatano, M. Yamamoto

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

All layer thicknesses of a 40 periods EUV multilayer composed of Mo and Si with a designed period thickness of 6.918 nm were measured by our in situ ellipsometry. The period thickness of Mo/Si multilayer was obtained to be 7.07 nm in average. This coincides well with period thicknesses of 7.078 and 7.081 nm as determined respectively by EUV reflectometry and X-ray diffractometry after fabrication. The difference of 0.01 nm, which is as to be 0.14%, is sufficiently small for precise period thickness control of EUV multilayer fabrication.

Original languageEnglish
Pages (from-to)1083-1085
Number of pages3
JournalJournal of Electron Spectroscopy and Related Phenomena
Volume144-147
DOIs
Publication statusPublished - 2005 Jun 1

Keywords

  • EUV multilayer
  • Ellipsometry
  • Layer-by-layer analysis
  • Rate monitoring

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Radiation
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Spectroscopy
  • Physical and Theoretical Chemistry

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