TY - JOUR
T1 - Accurate measurement of EUV multilayer period thicknesses by in situ automatic ellipsometry
AU - Tsuru, T.
AU - Tsutou, T.
AU - Hatano, T.
AU - Yamamoto, M.
N1 - Funding Information:
This research was partially supported by Grant-in-Aid for Specially Promoted Research, No. 15002001, and Young Scientists (B), No. 16760030 from the Ministry of Education, Culture, Sports, Science and Technology, Japan.
PY - 2005/6
Y1 - 2005/6
N2 - All layer thicknesses of a 40 periods EUV multilayer composed of Mo and Si with a designed period thickness of 6.918 nm were measured by our in situ ellipsometry. The period thickness of Mo/Si multilayer was obtained to be 7.07 nm in average. This coincides well with period thicknesses of 7.078 and 7.081 nm as determined respectively by EUV reflectometry and X-ray diffractometry after fabrication. The difference of 0.01 nm, which is as to be 0.14%, is sufficiently small for precise period thickness control of EUV multilayer fabrication.
AB - All layer thicknesses of a 40 periods EUV multilayer composed of Mo and Si with a designed period thickness of 6.918 nm were measured by our in situ ellipsometry. The period thickness of Mo/Si multilayer was obtained to be 7.07 nm in average. This coincides well with period thicknesses of 7.078 and 7.081 nm as determined respectively by EUV reflectometry and X-ray diffractometry after fabrication. The difference of 0.01 nm, which is as to be 0.14%, is sufficiently small for precise period thickness control of EUV multilayer fabrication.
KW - EUV multilayer
KW - Ellipsometry
KW - Layer-by-layer analysis
KW - Rate monitoring
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U2 - 10.1016/j.elspec.2005.01.087
DO - 10.1016/j.elspec.2005.01.087
M3 - Article
AN - SCOPUS:17444398221
VL - 144-147
SP - 1083
EP - 1085
JO - Journal of Electron Spectroscopy and Related Phenomena
JF - Journal of Electron Spectroscopy and Related Phenomena
SN - 0368-2048
ER -