Abstract
All layer thicknesses of a 40 periods EUV multilayer composed of Mo and Si with a designed period thickness of 6.918 nm were measured by our in situ ellipsometry. The period thickness of Mo/Si multilayer was obtained to be 7.07 nm in average. This coincides well with period thicknesses of 7.078 and 7.081 nm as determined respectively by EUV reflectometry and X-ray diffractometry after fabrication. The difference of 0.01 nm, which is as to be 0.14%, is sufficiently small for precise period thickness control of EUV multilayer fabrication.
Original language | English |
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Pages (from-to) | 1083-1085 |
Number of pages | 3 |
Journal | Journal of Electron Spectroscopy and Related Phenomena |
Volume | 144-147 |
DOIs | |
Publication status | Published - 2005 Jun 1 |
Keywords
- EUV multilayer
- Ellipsometry
- Layer-by-layer analysis
- Rate monitoring
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Radiation
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Spectroscopy
- Physical and Theoretical Chemistry