Accurate determination of the intrinsic diffusivities of boron, phosphorus, and arsenic in silicon: The influence of SiO2 films

Miki Naganawa, Yoko Kawamura, Yasuo Shimizu, Masashi Uematsu, Kohei M. Itoh, Hiroyuki Ito, Mitsutoshi Nakamura, Hideaki Ishikawa, Yuzuru Ohji

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