Acceleration of deposition rates in a chemical vapor deposition process by laser irradiation

Hidetoshi Miyazaki, Teiichi Kimura, Takashi Goto

Research output: Contribution to journalLetter

27 Citations (Scopus)

Abstract

Yttria-stabilized zirconia (YSZ) films were prepared by a laser Chemical vapor deposition (CVD) process. A plasma-like strong light emission was observed from a reaction zone around a substrate by laser irradiation. The deposition rates were significantly increased from 1 to 230 μm/h. The charges in the light-emitting zone consisted of mainly positive and negative ions, but electrons scarcely existed. The emitted light had a continuous spectrum similar to the Planck distribution.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume42
Issue number3 B
Publication statusPublished - 2003 Mar 15

Keywords

  • Chemical vapor deposition
  • Continuous spectrum
  • High deposition rate
  • Langmuir probe

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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