AC impedance study of pattern formation of silver electrodeposits

Iwao Mogi; Masao Kamiko

doi:10.1142/S0218348X96000303

AC impedance study of pattern formation of silver electrodeposits

Iwao Mogi, Masao Kamiko

Materials Property Division

Research output: Contribution to journal › Article › peer-review

Abstract

Electrochemical impedance was examined in the two-dimensional growth of Ag electrodeposits to investigate the rate-determining step in the pattern formation of the aggregates. The frequency dispersions of the in-situ ac impedance during the electrodeposition demonstrated that the open-ramified growth is diffusion-limited, the dendritic growth is reaction-limited, the homogeneous growth is electric-migration-limited and the DBM (dense branching morphology) growth is both diffusion and electric-migration controlled.

Original language	English
Pages (from-to)	219-225
Number of pages	7
Journal	Fractals
Volume	4
Issue number	2
DOIs	https://doi.org/10.1142/S0218348X96000303
Publication status	Published - 1996 Jun

ASJC Scopus subject areas

Modelling and Simulation
Geometry and Topology
Applied Mathematics

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abstract = "Electrochemical impedance was examined in the two-dimensional growth of Ag electrodeposits to investigate the rate-determining step in the pattern formation of the aggregates. The frequency dispersions of the in-situ ac impedance during the electrodeposition demonstrated that the open-ramified growth is diffusion-limited, the dendritic growth is reaction-limited, the homogeneous growth is electric-migration-limited and the DBM (dense branching morphology) growth is both diffusion and electric-migration controlled.",

author = "Iwao Mogi and Masao Kamiko",

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