Absorption property in visible region of TiO2-xNx films prepared by reactive sputtering

Ming Zhao, Ling Fang, Gong Zhang, Daming Zhuang

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


N-doped TiO2 films were prepared by mid-frequency alternative reactive magnetron sputtering. The N concentration of the TiO2-xNx films was analyzed by XPS. And the absorption properties of the films in visible region were investigated. The results show that the mass fraction of Ng in reactive gases is a key variable in influencing the concentration of Ti-N bond in TiO2-xNx films. Annealing TiO2-x film in nitrogen atmosphere at 380°C is favorable for increasing its atomic concentration of nitrogen. The increase of the thickness of TiO2-x films can enhance the absorbability of the TiO2-x films. The wavelength of the absorption edge for TiO2-x film with 1.5% nitrogen has a obvious redshift from 387 nm to 441 nm.

Original languageEnglish
Pages (from-to)108-112
Number of pages5
JournalCailiao Yanjiu Xuebao/Chinese Journal of Materials Research
Issue number1
Publication statusPublished - 2004 Feb


  • Absorption in visible region
  • Inorganic non-metallic materials
  • Mid-frequency alternative reactive magnetron sputtering
  • Nitrogen-doping
  • TiO films

ASJC Scopus subject areas

  • Metals and Alloys
  • Chemical Engineering (miscellaneous)
  • Polymers and Plastics


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