Ab initio calculation of F atom desorption in tungsten chemical vapor deposition process using WF6 and H2

Kazuhito Nishitani, Shigeyuki Takagi, Masaaki Kanoh, Toshiyuki Yokosuka, Katsumi Sasata, Tomonori Kusagaya, Seiichi Takami, Momoji Kubo, Akira Miyamoto

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