A15Nb3Si produced by high-pressure annealing of amorphous sputter deposits

H. Iwasaki, W. K. Wang, N. Toyota, T. Fukase, H. Fujimori, Y. Akahama, S. Endo

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)


A high-pressure annealing technique has been used to convert an amorphous Nb-23.7 at.% Si alloy, prepared by sputtering, into the A15 phase alloy. X-ray diffraction examination of the alloy samples quenched to ambient conditions has shown that they are in an almost single-phased state with a lattice parameter of 0.5120 nm and a high degree of atomic ordering. An onset of superconductivity has been detected at 8.9 K and a temperature derivative of upper critical field is 14 kOe/K (MA/4π mK).

Original languageEnglish
Pages (from-to)381-384
Number of pages4
JournalSolid State Communications
Issue number5
Publication statusPublished - 1982 May
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry


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