A Ta/Mo interdiffusion dual metal gate technology for drivability enhancement of FinFETs

Takashi Matsukawa, Kazuhiko Endo, Yongxun Liu, Shinichi O'uchi, Yuki Ishikawa, Hiromi Yamauchi, Junichi Tsukada, Kenichi Ishii, Meishoku Masahara, Kunihiro Sakamoto, Eiichi Suzuki

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8 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds