A study on the preparation of TiO2-xNx films by reactive deposition and their absorption properties in visible region

Ming Zhao, Daming Zhuang, Gong Zhang, Ling Fang, Minsheng Wu

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

The nitrogen-doped TiO2 thin films were prepared by mid-frequency alternative reactive magnetron sputtering technique. The N concentration of the nitrogen-doped TiO2 thin films was analyzed by XPS. And the absorption spectra of the films in ultraviolet and visible region were also investigated. The results show that the mid-frequency alternative reactive magnetron sputtering technique is a convenient method for growing TiO2-xNx. Annealing the nitrogen-doped TiO2 thin film in nitrogen atmosphere under 380°C is helpful for increase the concentration of nitrogen in the film, but the ratio of N2 in reactive gas is mainly influence the concentration of nitrogen in the Ti-N bond in the TiO2 film. The increase of the thickness of nitrogen-doped TiO2 films will enhance the absorbability of the film in the ultraviolet and visible region. The wavelength of the absorption edge of TiO2-xNx film with 1.5% nitrogen shift to 441nm from 387nm, which is the absorption edge for undoped TiO2 films.

Original languageEnglish
Pages (from-to)1223-1226
Number of pages4
JournalMaterials Science Forum
Volume475-479
Issue numberII
Publication statusPublished - 2005

Keywords

  • Absorption in visible region
  • Mid-frequency alternative reactive magnetron sputtering
  • Nitrogen-doped
  • TiO films

ASJC Scopus subject areas

  • Materials Science(all)

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