A simple method for fabrication of mesoporous films using a rapid heating process

Takeo Yamada; Haoshen Zhou; Itaru Honma; Yuko Ueno; Tsutomu Horiuchi; Osamu Niwa

doi:10.1246/cl.2005.328

A simple method for fabrication of mesoporous films using a rapid heating process

Takeo Yamada, Haoshen Zhou, Itaru Honma, Yuko Ueno, Tsutomu Horiuchi, Osamu Niwa

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Mesoporous silica SBA-15 and SBA-16 films can be successfully prepared on a substrate by a simple method involving a rapid heating process, which is controlled by a voltage applied to a heating electrode on the substrate. This advantageous method has considerable potential for electronic device fabrication processes.

Original language	English
Pages (from-to)	328-329
Number of pages	2
Journal	Chemistry Letters
Volume	34
Issue number	3
DOIs	https://doi.org/10.1246/cl.2005.328
Publication status	Published - 2005 Mar 5
Externally published	Yes

ASJC Scopus subject areas

Chemistry(all)

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author = "Takeo Yamada and Haoshen Zhou and Itaru Honma and Yuko Ueno and Tsutomu Horiuchi and Osamu Niwa",

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AU - Zhou, Haoshen

AU - Honma, Itaru

AU - Ueno, Yuko

AU - Horiuchi, Tsutomu

AU - Niwa, Osamu

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Y1 - 2005/3/5

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