A simple method for fabrication of mesoporous films using a rapid heating process

Takeo Yamada; Haoshen Zhou; Itaru Honma; Yuko Ueno; Tsutomu Horiuchi; Osamu Niwa

doi:10.1246/cl.2005.328

A simple method for fabrication of mesoporous films using a rapid heating process

Takeo Yamada, Haoshen Zhou, Itaru Honma, Yuko Ueno, Tsutomu Horiuchi, Osamu Niwa

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Mesoporous silica SBA-15 and SBA-16 films can be successfully prepared on a substrate by a simple method involving a rapid heating process, which is controlled by a voltage applied to a heating electrode on the substrate. This advantageous method has considerable potential for electronic device fabrication processes.

Original language	English
Pages (from-to)	328-329
Number of pages	2
Journal	Chemistry Letters
Volume	34
Issue number	3
DOIs	https://doi.org/10.1246/cl.2005.328
Publication status	Published - 2005 Mar 5
Externally published	Yes

ASJC Scopus subject areas

Chemistry(all)

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10.1246/cl.2005.328

Cite this

@article{e6be427dba1e4828a47edf9891f118c3,

title = "A simple method for fabrication of mesoporous films using a rapid heating process",

abstract = "Mesoporous silica SBA-15 and SBA-16 films can be successfully prepared on a substrate by a simple method involving a rapid heating process, which is controlled by a voltage applied to a heating electrode on the substrate. This advantageous method has considerable potential for electronic device fabrication processes.",

author = "Takeo Yamada and Haoshen Zhou and Itaru Honma and Yuko Ueno and Tsutomu Horiuchi and Osamu Niwa",

year = "2005",

month = mar,

day = "5",

doi = "10.1246/cl.2005.328",

language = "English",

volume = "34",

pages = "328--329",

journal = "Chemistry Letters",

issn = "0366-7022",

publisher = "Chemical Society of Japan",

number = "3",

}

TY - JOUR

T1 - A simple method for fabrication of mesoporous films using a rapid heating process

AU - Yamada, Takeo

AU - Zhou, Haoshen

AU - Honma, Itaru

AU - Ueno, Yuko

AU - Horiuchi, Tsutomu

AU - Niwa, Osamu

PY - 2005/3/5

Y1 - 2005/3/5

N2 - Mesoporous silica SBA-15 and SBA-16 films can be successfully prepared on a substrate by a simple method involving a rapid heating process, which is controlled by a voltage applied to a heating electrode on the substrate. This advantageous method has considerable potential for electronic device fabrication processes.

AB - Mesoporous silica SBA-15 and SBA-16 films can be successfully prepared on a substrate by a simple method involving a rapid heating process, which is controlled by a voltage applied to a heating electrode on the substrate. This advantageous method has considerable potential for electronic device fabrication processes.

UR - http://www.scopus.com/inward/record.url?scp=19444378678&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=19444378678&partnerID=8YFLogxK

U2 - 10.1246/cl.2005.328

DO - 10.1246/cl.2005.328

M3 - Article

AN - SCOPUS:19444378678

VL - 34

SP - 328

EP - 329

JO - Chemistry Letters

JF - Chemistry Letters

SN - 0366-7022

IS - 3

ER -

A simple method for fabrication of mesoporous films using a rapid heating process

Abstract

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