A simple fabrication process using focused ion beam for deep submicron magnetic tunnel junctions

Daisuke Watanabe, Hitoshi Kubota, Yasuo Ando, Terunobu Miyazaki

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Focused ion beam (FIB) induced tungsten deposition technique was applied to fabrication of small (few-hundred-nanometer scale) magnetic tunnel junctions (MTJs). The deposited tungsten pattern was used as an etching mask and a metal connection between an MTJ and a lead line. This fabrication method can eliminate some difficult process steps so that deep submicronsized MTJs can be fabricated easily and reproducibly. This technique is useful to evaluate basic properties of small MTJs for spin-electronics devices.

Original languageEnglish
Pages (from-to)7489-7490
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number11 A
DOIs
Publication statusPublished - 2004 Nov 1

Keywords

  • Focused ion beam induced deposition
  • Magnetic tunnel junctions
  • Submicron
  • Tungsten

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'A simple fabrication process using focused ion beam for deep submicron magnetic tunnel junctions'. Together they form a unique fingerprint.

Cite this