A reflection-type vapor cell using anisotropic etching of silicon for micro atomic clocks

Hitoshi Nishino, Motoaki Hara, Yuichiro Yano, Masaya Toda, Yoshiaki Kanamori, Masatoshi Kajita, Tetsuya Ido, Takahito Ono

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

This paper reports the design, fabrication and evaluation of a reflection-type optical Rb vapor cell for chip-scale micro atomic clocks. To reduce the physical package height, the reflection-type vapor cell is developed, in which optical components can be mounted on one side of the vapor cell. A (100)-oriented Si wafer with a cut-off 9.74° toward [011] direction is used to make 45° mirrors by anisotropic wet etching. 90° mirrors are fabricated by Si deep reactive ion etching and surface planarization using H2 annealing. Following the detection of D1 optical absorption for Rb atoms, coherent population trapping resonance was observed.

Original languageEnglish
Article number072012
JournalApplied Physics Express
Volume12
Issue number7
DOIs
Publication statusPublished - 2019 Jul 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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