A reaction-diffusion model performing stripe- and spot-image restoration and its LSI implementation

Yohei Suzuki, Takahiro Takayama, Ikuko N. Motoike, Tetsuya Asai

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

This paper is intended to develop an LSI that restores in real time an image pattern with defects and contamination. To this end, based on the principle of shape formation in biological bodies, a reaction-diffusion model that can generate and repair Turing patterns, such as stripes and spots seen in fingerprint and body marks, is proposed. A parallel architecture of the reaction-diffusion chips incorporating this model is presented. By means of circuit simulation, it is shown that this LSI can restore stripe (spot) patterns.

Original languageEnglish
Pages (from-to)20-29
Number of pages10
JournalElectronics and Communications in Japan, Part III: Fundamental Electronic Science (English translation of Denshi Tsushin Gakkai Ronbunshi)
Volume90
Issue number1
DOIs
Publication statusPublished - 2007 Jan 1
Externally publishedYes

Keywords

  • Image restoration
  • Reaction-diffusion chip
  • Reaction-diffusion system
  • Turing system

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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