A rapid prototyping of real-time pattern generator for step-and-scan lithography using digital micromirror device

Naoto Miyamoto, Masahiko Shimakage, Tatsuo Morimoto, Kazuya Kadota, Shigetoshi Sugawa, Tadahiro Ohmi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

An FPGA prototyping of real-time pattern generator for step-and-scan lithography equipment using Digital Micromirror Device (DMD) is described. It supports IM sample/sec stage position data acquisition for high-speed and high-accuracy pattern generation. It also supports arbitrary pixel-level masking to cancel the effect of DMD manufacturing variability. We have developed the sliding window at the interface of the frame buffer in order to cancel stage fluctuation. We have also developed a fast and small data converter from binary bitmap to DMD format. This pattern generator has been successfully implemented to FPGA Stratix-It EP2S180 with max clock frequency at 123.93 MHz and max DMD frame rate at 1,202 frame/sec.

Original languageEnglish
Title of host publicationICFPT 2007 - International Conference on Field Programmable Technology
Pages305-308
Number of pages4
DOIs
Publication statusPublished - 2007 Dec 1
EventInternational Conference on Field Programmable Technology, ICFPT 2007 - Kitakyushu, Japan
Duration: 2007 Dec 122007 Dec 14

Publication series

NameICFPT 2007 - International Conference on Field Programmable Technology

Other

OtherInternational Conference on Field Programmable Technology, ICFPT 2007
Country/TerritoryJapan
CityKitakyushu
Period07/12/1207/12/14

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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