TY - JOUR
T1 - A prospective microwave plasma source for
T2 - In situ spaceflight applications
AU - Farcy, B. J.
AU - Arevalo, R. D.
AU - Taghioskoui, M.
AU - McDonough, W. F.
AU - Benna, M.
AU - Brinckerhoff, W. B.
N1 - Funding Information:
This research was funded through the NASA ROSES PICASSO Program, specically Grant 80NSSC18K0932. The groundwork for the miniature plasma characterized here was enabled through the NASA SBIR Program, specically Award 80NSSC18K0207. M. T. acknowledges additional funding and support provided by the Massachusetts Clean Energy Center (MassCEC) under AmplyMass program.
PY - 2020/11
Y1 - 2020/11
N2 - Noble gas plasmas are commonly used as ion and excitation sources in inductively coupled plasma (ICP) optical emission and mass spectrometry for organic and inorganic chemical analysis. However, the high power (∼kW) and voluminous gas flow rate (∼15 L min-1) of commercial plasmas limit their potential deployment in remote terrestrial and planetary environments. Here, using argon and helium gas supplies, we investigate the fundamental characteristics of low power and reduced-pressure microwave plasmas for organic and elemental analysis. These plasmas require a fraction of the power (<25 W) and gas (<0.2 L min-1) compared to conventional ICP systems. Langmuir probe measurements were used to determine electron temperatures and electron densities for both helium and argon plasmas under a range of forward of powers and gas flow rates. Ionization efficiencies for select organic compounds and elemental species were estimated from these results using the Saha equation. Our findings show that at 23 W of forward power and 0.2 L min-1 gas flow rate, an argon plasma can fully ionize (>99%) organic molecules or elements with high ionization potentials (e.g. glycine, 8.9 eV, or S, 10.4 eV); in comparison, helium can achieve similar performance metrics with as little as 5 W of forward power.
AB - Noble gas plasmas are commonly used as ion and excitation sources in inductively coupled plasma (ICP) optical emission and mass spectrometry for organic and inorganic chemical analysis. However, the high power (∼kW) and voluminous gas flow rate (∼15 L min-1) of commercial plasmas limit their potential deployment in remote terrestrial and planetary environments. Here, using argon and helium gas supplies, we investigate the fundamental characteristics of low power and reduced-pressure microwave plasmas for organic and elemental analysis. These plasmas require a fraction of the power (<25 W) and gas (<0.2 L min-1) compared to conventional ICP systems. Langmuir probe measurements were used to determine electron temperatures and electron densities for both helium and argon plasmas under a range of forward of powers and gas flow rates. Ionization efficiencies for select organic compounds and elemental species were estimated from these results using the Saha equation. Our findings show that at 23 W of forward power and 0.2 L min-1 gas flow rate, an argon plasma can fully ionize (>99%) organic molecules or elements with high ionization potentials (e.g. glycine, 8.9 eV, or S, 10.4 eV); in comparison, helium can achieve similar performance metrics with as little as 5 W of forward power.
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U2 - 10.1039/d0ja00198h
DO - 10.1039/d0ja00198h
M3 - Article
AN - SCOPUS:85095963868
VL - 35
SP - 2740
EP - 2747
JO - Journal of Analytical Atomic Spectrometry
JF - Journal of Analytical Atomic Spectrometry
SN - 0267-9477
IS - 11
ER -