A promising evaluation method of ultra-low-expansion glasses for the extreme ultra-violet lithography system by the line-focus-beam ultrasonic material characterization system

Jun Ichi Kushibiki, Mototaka Arakawa, Yuji Ohashi, Kouji Suzuki, Takahisa Maruyama

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

A super-precise method of evaluating the coefficient of thermal expansion (CTE) of ultra-low-expansion glasses was developed using the line-focus-beam ultrasonic material characterization (LFB-UMC) system and was demonstrated for TiO2-doped SiO2 glass. The sensitivity and resolution in the velocity measurement of leaky surface acoustic waves (LSAWs) in CTE were estimated to be 4.40 (ppb/K)/(m/s) and ±0.77 ppb/K for ±2σ (σ: standard deviation) at 225 MHz. LSAW velocity differences caused by different TiO2 concentrations and distributions or striae in the specimens were successfully detected and evaluated, providing two-dimensional information. This ultrasonic method is effective for evaluating ultra-low-expansion glasses needed for extreme ultra-violet lithography (EUVL) systems.

Original languageEnglish
Pages (from-to)L1455-L1457
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume43
Issue number11 A
DOIs
Publication statusPublished - 2004 Nov 1

Keywords

  • CTE evaluation
  • EUVL system
  • Leaky surface acoustic waves
  • Line-focus-beam ultrasonic material characterization system
  • TiO -doped SiO glass
  • Ultra-low-expansion glasses
  • Velocity measurement

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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