A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems

Akio Higo, K. Takahashi, H. Fujita, Y. Nakano, H. Toshiyoshi

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    2 Citations (Scopus)

    Abstract

    We have developed novel mask materials against HF Vapor release for MEMS/NEMS. Parylene-C has a tolerant material against moisture pass, and then, thin aluminum layer has also tolerant against HF vapor. We combined them together for high tolerance and we have successfully obtained completely non-etched silicon oxide layer under HF vapor exposure by Parylene/Al/Parylene sandwich structure.

    Original languageEnglish
    Title of host publicationTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
    Pages196-199
    Number of pages4
    DOIs
    Publication statusPublished - 2009 Dec 11
    EventTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems - Denver, CO, United States
    Duration: 2009 Jun 212009 Jun 25

    Publication series

    NameTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems

    Other

    OtherTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
    CountryUnited States
    CityDenver, CO
    Period09/6/2109/6/25

    Keywords

    • HF vapor protection
    • HF vapor release technique
    • Parylene

    ASJC Scopus subject areas

    • Hardware and Architecture
    • Electrical and Electronic Engineering

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