A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems

Akio Higo; K. Takahashi; H. Fujita; Y. Nakano; H. Toshiyoshi

doi:10.1109/SENSOR.2009.5285531

A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems

Akio Higo, K. Takahashi, H. Fujita, Y. Nakano, H. Toshiyoshi

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Citations (Scopus)

Abstract

We have developed novel mask materials against HF Vapor release for MEMS/NEMS. Parylene-C has a tolerant material against moisture pass, and then, thin aluminum layer has also tolerant against HF vapor. We combined them together for high tolerance and we have successfully obtained completely non-etched silicon oxide layer under HF vapor exposure by Parylene/Al/Parylene sandwich structure.

Original language	English
Title of host publication	TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
Pages	196-199
Number of pages	4
DOIs	https://doi.org/10.1109/SENSOR.2009.5285531
Publication status	Published - 2009
Externally published	Yes
Event	TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems - Denver, CO, United States Duration: 2009 Jun 21 → 2009 Jun 25

Publication series

Name	TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems

Other

Other	TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
Country/Territory	United States
City	Denver, CO
Period	09/6/21 → 09/6/25

Keywords

HF vapor protection
HF vapor release technique
Parylene

ASJC Scopus subject areas

Hardware and Architecture
Electrical and Electronic Engineering

Access to Document

10.1109/SENSOR.2009.5285531

Cite this

Higo, A., Takahashi, K., Fujita, H., Nakano, Y., & Toshiyoshi, H. (2009). A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems. In TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems (pp. 196-199). [5285531] (TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems). https://doi.org/10.1109/SENSOR.2009.5285531

A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems. / Higo, Akio; Takahashi, K.; Fujita, H. et al.

TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems. 2009. p. 196-199 5285531 (TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Higo, A, Takahashi, K, Fujita, H, Nakano, Y & Toshiyoshi, H 2009, A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems. in TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems., 5285531, TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems, pp. 196-199, TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems, Denver, CO, United States, 09/6/21. https://doi.org/10.1109/SENSOR.2009.5285531

Higo A, Takahashi K, Fujita H, Nakano Y, Toshiyoshi H. A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems. In TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems. 2009. p. 196-199. 5285531. (TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems). doi: 10.1109/SENSOR.2009.5285531

Higo, Akio ; Takahashi, K. ; Fujita, H. et al. / A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems. TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems. 2009. pp. 196-199 (TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems).

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abstract = "We have developed novel mask materials against HF Vapor release for MEMS/NEMS. Parylene-C has a tolerant material against moisture pass, and then, thin aluminum layer has also tolerant against HF vapor. We combined them together for high tolerance and we have successfully obtained completely non-etched silicon oxide layer under HF vapor exposure by Parylene/Al/Parylene sandwich structure.",

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A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems

Abstract

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Keywords

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