A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter

Ling Han Li, Akio Higo, Masanori Kubota, Masakazu Sugiyama, Yoshiaki Nakano

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    3 Citations (Scopus)

    Abstract

    A novel etching and oxidation method utilizing space effect of dry etching for three dimensional silicon structure is presented. Testing devices of SOI symmetric waveguide with ultra thick SiO2 cladding and silicon waveguide structure integrated with 3D taper spot size converter are fabricated using this method

    Original languageEnglish
    Title of host publication2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
    Pages27-28
    Number of pages2
    DOIs
    Publication statusPublished - 2008 Oct 23
    Event2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS - Freiburg, Germany
    Duration: 2008 Aug 112008 Aug 14

    Publication series

    Name2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS

    Other

    Other2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
    CountryGermany
    CityFreiburg
    Period08/8/1108/8/14

    Keywords

    • Spot size converter
    • Sub micron etching and oxidation
    • Symmetric SOI waveguide
    • Ultra thick SiO layer

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering

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