A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter

Ling Han Li; Akio Higo; Masanori Kubota; Masakazu Sugiyama; Yoshiaki Nakano

doi:10.1109/OMEMS.2008.4607811

A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter

Ling Han Li, Akio Higo, Masanori Kubota, Masakazu Sugiyama, Yoshiaki Nakano

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Citations (Scopus)

Abstract

A novel etching and oxidation method utilizing space effect of dry etching for three dimensional silicon structure is presented. Testing devices of SOI symmetric waveguide with ultra thick SiO₂ cladding and silicon waveguide structure integrated with 3D taper spot size converter are fabricated using this method

Original language	English
Title of host publication	2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
Pages	27-28
Number of pages	2
DOIs	https://doi.org/10.1109/OMEMS.2008.4607811
Publication status	Published - 2008 Oct 23
Event	2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS - Freiburg, Germany Duration: 2008 Aug 11 → 2008 Aug 14

Publication series

Name	2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS

Other

Other	2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
Country	Germany
City	Freiburg
Period	08/8/11 → 08/8/14

Keywords

Spot size converter
Sub micron etching and oxidation
Symmetric SOI waveguide
Ultra thick SiO layer

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1109/OMEMS.2008.4607811

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Li, L. H., Higo, A., Kubota, M., Sugiyama, M., & Nakano, Y. (2008). A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter. In 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS (pp. 27-28). [4607811] (2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS). https://doi.org/10.1109/OMEMS.2008.4607811

A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter. / Li, Ling Han; Higo, Akio; Kubota, Masanori; Sugiyama, Masakazu; Nakano, Yoshiaki.

2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS. 2008. p. 27-28 4607811 (2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Li, LH, Higo, A, Kubota, M, Sugiyama, M & Nakano, Y 2008, A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter. in 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS., 4607811, 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS, pp. 27-28, 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS, Freiburg, Germany, 08/8/11. https://doi.org/10.1109/OMEMS.2008.4607811

Li LH, Higo A, Kubota M, Sugiyama M, Nakano Y. A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter. In 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS. 2008. p. 27-28. 4607811. (2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS). https://doi.org/10.1109/OMEMS.2008.4607811

Li, Ling Han ; Higo, Akio ; Kubota, Masanori ; Sugiyama, Masakazu ; Nakano, Yoshiaki. / A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter. 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS. 2008. pp. 27-28 (2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS).

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abstract = "A novel etching and oxidation method utilizing space effect of dry etching for three dimensional silicon structure is presented. Testing devices of SOI symmetric waveguide with ultra thick SiO2 cladding and silicon waveguide structure integrated with 3D taper spot size converter are fabricated using this method",

keywords = "Spot size converter, Sub micron etching and oxidation, Symmetric SOI waveguide, Ultra thick SiO layer",

author = "Li, {Ling Han} and Akio Higo and Masanori Kubota and Masakazu Sugiyama and Yoshiaki Nakano",

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A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter

Abstract

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Keywords

ASJC Scopus subject areas

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