TY - GEN
T1 - A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter
AU - Li, Ling Han
AU - Higo, Akio
AU - Kubota, Masanori
AU - Sugiyama, Masakazu
AU - Nakano, Yoshiaki
PY - 2008/10/23
Y1 - 2008/10/23
N2 - A novel etching and oxidation method utilizing space effect of dry etching for three dimensional silicon structure is presented. Testing devices of SOI symmetric waveguide with ultra thick SiO2 cladding and silicon waveguide structure integrated with 3D taper spot size converter are fabricated using this method
AB - A novel etching and oxidation method utilizing space effect of dry etching for three dimensional silicon structure is presented. Testing devices of SOI symmetric waveguide with ultra thick SiO2 cladding and silicon waveguide structure integrated with 3D taper spot size converter are fabricated using this method
KW - Spot size converter
KW - Sub micron etching and oxidation
KW - Symmetric SOI waveguide
KW - Ultra thick SiO layer
UR - http://www.scopus.com/inward/record.url?scp=54049114359&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=54049114359&partnerID=8YFLogxK
U2 - 10.1109/OMEMS.2008.4607811
DO - 10.1109/OMEMS.2008.4607811
M3 - Conference contribution
AN - SCOPUS:54049114359
SN - 9781424419180
T3 - 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
SP - 27
EP - 28
BT - 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
T2 - 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
Y2 - 11 August 2008 through 14 August 2008
ER -